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Chemical patterning of silicon dioxide substrates for selective deposition of gold nanoparticles and fabrication of single-electron transistors

Publication ,  Journal Article
Coskun, UC; Mebrahtu, H; Huang, P; Huang, J; Biasco, A; Makarovski, A; Lazarides, A; LaBean, T; Finkelstein, G
Published in: Applied Physics Letters
2008

Duke Scholars

Published In

Applied Physics Letters

Publication Date

2008

Volume

93

Start / End Page

123101

Related Subject Headings

  • Applied Physics
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences
 

Citation

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Coskun, U. C., Mebrahtu, H., Huang, P., Huang, J., Biasco, A., Makarovski, A., … Finkelstein, G. (2008). Chemical patterning of silicon dioxide substrates for selective deposition of gold nanoparticles and fabrication of single-electron transistors. Applied Physics Letters, 93, 123101.
Coskun, U. C., H. Mebrahtu, P. Huang, J. Huang, A. Biasco, A. Makarovski, A. Lazarides, T. LaBean, and G. Finkelstein. “Chemical patterning of silicon dioxide substrates for selective deposition of gold nanoparticles and fabrication of single-electron transistors.” Applied Physics Letters 93 (2008): 123101.
Coskun UC, Mebrahtu H, Huang P, Huang J, Biasco A, Makarovski A, et al. Chemical patterning of silicon dioxide substrates for selective deposition of gold nanoparticles and fabrication of single-electron transistors. Applied Physics Letters. 2008;93:123101.
Coskun UC, Mebrahtu H, Huang P, Huang J, Biasco A, Makarovski A, Lazarides A, LaBean T, Finkelstein G. Chemical patterning of silicon dioxide substrates for selective deposition of gold nanoparticles and fabrication of single-electron transistors. Applied Physics Letters. 2008;93:123101.

Published In

Applied Physics Letters

Publication Date

2008

Volume

93

Start / End Page

123101

Related Subject Headings

  • Applied Physics
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences