Field emission characteristics of diamond coated silicon field emitters
Publication
, Journal Article
Liu, J; Zhirnov, VV; Myers, AF; Wojak, GJ; Choi, WB; Hren, JJ; Wolter, SD; McClure, MT; Stoner, BR; Glass, JT
Published in: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
March 1, 1995
Single crystal silicon field emitters have been modified by surface deposition of diamond using bias-enhanced microwave plasma chemical vapor deposition. Polycrystalline diamond with a high nucleation density (1010/cm2) and small grain size (<20 nm) was achieved on silicon field emitters. Field emission from these diamond coated emitters exhibited significant enhancement both in total emission current and stability compared to pure silicon emitters. A large effective emitting area comparable to the tip surface area was obtained from a Fowler-Nordheim analysis. The effective work function of the polycrystalline diamond coated emitter surface was found to be larger than that of a pure silicon emitter surface.
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Published In
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
DOI
ISSN
0734-211X
Publication Date
March 1, 1995
Volume
13
Issue
2
Start / End Page
422 / 426
Citation
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Liu, J., Zhirnov, V. V., Myers, A. F., Wojak, G. J., Choi, W. B., Hren, J. J., … Glass, J. T. (1995). Field emission characteristics of diamond coated silicon field emitters. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 13(2), 422–426. https://doi.org/10.1116/1.587961
Liu, J., V. V. Zhirnov, A. F. Myers, G. J. Wojak, W. B. Choi, J. J. Hren, S. D. Wolter, M. T. McClure, B. R. Stoner, and J. T. Glass. “Field emission characteristics of diamond coated silicon field emitters.” Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 13, no. 2 (March 1, 1995): 422–26. https://doi.org/10.1116/1.587961.
Liu J, Zhirnov VV, Myers AF, Wojak GJ, Choi WB, Hren JJ, et al. Field emission characteristics of diamond coated silicon field emitters. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 1995 Mar 1;13(2):422–6.
Liu, J., et al. “Field emission characteristics of diamond coated silicon field emitters.” Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 13, no. 2, Mar. 1995, pp. 422–26. Scopus, doi:10.1116/1.587961.
Liu J, Zhirnov VV, Myers AF, Wojak GJ, Choi WB, Hren JJ, Wolter SD, McClure MT, Stoner BR, Glass JT. Field emission characteristics of diamond coated silicon field emitters. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 1995 Mar 1;13(2):422–426.
Published In
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
DOI
ISSN
0734-211X
Publication Date
March 1, 1995
Volume
13
Issue
2
Start / End Page
422 / 426