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Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content

Publication ,  Journal Article
Gao, Y; Yang, W; Qu, C; Pan, C; Zhou, Z; Liu, T; Ren, L; Zheng, C; Li, G
Published in: Journal of Physics D: Applied Physics
February 27, 2026

BiVO (BVO), a photocatalytic material with broad application prospects, faces practical limitations due to high photogenerated carrier recombination rates and poor charge mobility. Oxygen vacancies play a crucial role in regulating the photocatalytic performance of BiVO . Elemental doping can modulate oxygen vacancy concentration, but establishing a precise, quantitative relationship between dopant concentration and oxygen vacancy formation remains a challenge. To address these challenges, this study employed magnetron sputtering technology to establish a relatively ideal single-crystal thin-film system that minimizes interference from complex factors. Within this system, controlled Mo doping was implemented to precisely regulate the oxygen vacancy concentration. The focus is on investigating the impact of Mo doping on BVO’s physical properties. Characterization confirmed that the monoclinic crystal structure, epitaxial growth pattern, and surface morphology of Mo-doped BVO films remain unchanged, achieving stable Mo doping while preserving BVO lattice integrity. Detailed characterization demonstrated that the oxygen vacancy concentration could be linearly and precisely modulated by varying the Mo doping level, thereby establishing a quantitative relationship between doping and vacancy formation.

Duke Scholars

Published In

Journal of Physics D: Applied Physics

DOI

EISSN

1361-6463

ISSN

0022-3727

Publication Date

February 27, 2026

Volume

59

Issue

8

Start / End Page

085106 / 085106

Publisher

IOP Publishing

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
 

Citation

APA
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MLA
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Gao, Y., Yang, W., Qu, C., Pan, C., Zhou, Z., Liu, T., … Li, G. (2026). Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content. Journal of Physics D: Applied Physics, 59(8), 085106–085106. https://doi.org/10.1088/1361-6463/ae46ab
Gao, Yukai, Wei Yang, Cunlian Qu, Changwen Pan, Zhuolin Zhou, Tong Liu, Liteng Ren, Changcheng Zheng, and Guoqiang Li. “Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content.” Journal of Physics D: Applied Physics 59, no. 8 (February 27, 2026): 085106–085106. https://doi.org/10.1088/1361-6463/ae46ab.
Gao Y, Yang W, Qu C, Pan C, Zhou Z, Liu T, et al. Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content. Journal of Physics D: Applied Physics. 2026 Feb 27;59(8):085106–085106.
Gao, Yukai, et al. “Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content.” Journal of Physics D: Applied Physics, vol. 59, no. 8, IOP Publishing, Feb. 2026, pp. 085106–085106. Crossref, doi:10.1088/1361-6463/ae46ab.
Gao Y, Yang W, Qu C, Pan C, Zhou Z, Liu T, Ren L, Zheng C, Li G. Fabrication of high-quality Mo-doped BiVO 4 thin films with linearly controlled oxygen vacancy content. Journal of Physics D: Applied Physics. IOP Publishing; 2026 Feb 27;59(8):085106–085106.
Journal cover image

Published In

Journal of Physics D: Applied Physics

DOI

EISSN

1361-6463

ISSN

0022-3727

Publication Date

February 27, 2026

Volume

59

Issue

8

Start / End Page

085106 / 085106

Publisher

IOP Publishing

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering