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Simulation of sputtering from liquid Cu targets

Publication ,  Journal Article
Shapiro, MH; Lo, DY; Haff, PK; Tombrello, TA
Published in: Nuclear Inst. and Methods in Physics Research, B
March 1, 1986

The sputtering of Cu atoms from liquid targets by normally incident 5 keV Ar+ ions was simulated using the multiple interaction molecular dynamics technique. Yields, energy distributions, and angular distributions of sputtered atoms were obtained at several temperatures slightly above and below the experimental melting point of copper. In all cases the resulting angular distributions of ejected atoms peaked more sharply than the cos θ behavior predicted by linear cascade theory. The ratio of yields from individual layers of the liquid targets, and the energy and angular distributions of ejected atoms generally were found to be similar to those obtained in previous simulations with solid Cu targets. Our results also are in qualitative agreement with Dumke's measurements of angular distributions and layer yield ratios of sputtered atoms from liquid Ga-In eutectic alloy targets. In particular, no marked changes in yields or energy distributions were observed when the temperature of the target was lowered below the nominal melting point of copper. The angular distributions were found to broaden with increasing temperature. © 1986.

Duke Scholars

Published In

Nuclear Inst. and Methods in Physics Research, B

DOI

ISSN

0168-583X

Publication Date

March 1, 1986

Volume

13

Issue

1-3

Start / End Page

348 / 352

Related Subject Headings

  • Applied Physics
  • 0915 Interdisciplinary Engineering
  • 0402 Geochemistry
  • 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics
 

Citation

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Shapiro, M. H., Lo, D. Y., Haff, P. K., & Tombrello, T. A. (1986). Simulation of sputtering from liquid Cu targets. Nuclear Inst. and Methods in Physics Research, B, 13(1–3), 348–352. https://doi.org/10.1016/0168-583X(86)90525-2
Shapiro, M. H., D. Y. Lo, P. K. Haff, and T. A. Tombrello. “Simulation of sputtering from liquid Cu targets.” Nuclear Inst. and Methods in Physics Research, B 13, no. 1–3 (March 1, 1986): 348–52. https://doi.org/10.1016/0168-583X(86)90525-2.
Shapiro MH, Lo DY, Haff PK, Tombrello TA. Simulation of sputtering from liquid Cu targets. Nuclear Inst and Methods in Physics Research, B. 1986 Mar 1;13(1–3):348–52.
Shapiro, M. H., et al. “Simulation of sputtering from liquid Cu targets.” Nuclear Inst. and Methods in Physics Research, B, vol. 13, no. 1–3, Mar. 1986, pp. 348–52. Scopus, doi:10.1016/0168-583X(86)90525-2.
Shapiro MH, Lo DY, Haff PK, Tombrello TA. Simulation of sputtering from liquid Cu targets. Nuclear Inst and Methods in Physics Research, B. 1986 Mar 1;13(1–3):348–352.
Journal cover image

Published In

Nuclear Inst. and Methods in Physics Research, B

DOI

ISSN

0168-583X

Publication Date

March 1, 1986

Volume

13

Issue

1-3

Start / End Page

348 / 352

Related Subject Headings

  • Applied Physics
  • 0915 Interdisciplinary Engineering
  • 0402 Geochemistry
  • 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics