Ion-beam-induced atomic mixing
Publication
, Journal Article
Haff, PK; Switkowski, ZE
Published in: Journal of Applied Physics
December 1, 1977
Calculations based on the diffusion model are presented of atomic mixing by ion bombardment. This mixing is assumed to have its basis, as does sputtering, in the collision cascades generated by the primary beam. Sharp interfaces within a target are seen to be smoothed by ion bombardment. Mixing may place fundamental limits on the resolution of ion microprobes.
Duke Scholars
Published In
Journal of Applied Physics
DOI
ISSN
0021-8979
Publication Date
December 1, 1977
Volume
48
Issue
8
Start / End Page
3383 / 3386
Related Subject Headings
- Applied Physics
- 09 Engineering
- 02 Physical Sciences
- 01 Mathematical Sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Haff, P. K., & Switkowski, Z. E. (1977). Ion-beam-induced atomic mixing. Journal of Applied Physics, 48(8), 3383–3386. https://doi.org/10.1063/1.324179
Haff, P. K., and Z. E. Switkowski. “Ion-beam-induced atomic mixing.” Journal of Applied Physics 48, no. 8 (December 1, 1977): 3383–86. https://doi.org/10.1063/1.324179.
Haff PK, Switkowski ZE. Ion-beam-induced atomic mixing. Journal of Applied Physics. 1977 Dec 1;48(8):3383–6.
Haff, P. K., and Z. E. Switkowski. “Ion-beam-induced atomic mixing.” Journal of Applied Physics, vol. 48, no. 8, Dec. 1977, pp. 3383–86. Scopus, doi:10.1063/1.324179.
Haff PK, Switkowski ZE. Ion-beam-induced atomic mixing. Journal of Applied Physics. 1977 Dec 1;48(8):3383–3386.
Published In
Journal of Applied Physics
DOI
ISSN
0021-8979
Publication Date
December 1, 1977
Volume
48
Issue
8
Start / End Page
3383 / 3386
Related Subject Headings
- Applied Physics
- 09 Engineering
- 02 Physical Sciences
- 01 Mathematical Sciences