A topical antioxidant solution containing vitamins C and E stabilized by ferulic acid provides protection for human skin against damage caused by ultraviolet irradiation.

Published

Journal Article

BACKGROUND: Skin cancer and photoaging changes result from ultraviolet (UV)-induced oxidative stress. Topical antioxidants may protect skin from these effects. OBJECTIVE: We sought to determine whether a stable topical formulation of 15% L-ascorbic acid, 1% alpha-tocopherol, and 0.5% ferulic acid (CEFer) could protect human skin in vivo from substantial amounts of solar-simulated UV radiation. METHODS: CEFer and its vehicle were applied to separate patches of normal-appearing human skin for 4 days. Each patch was irradiated with solar-simulated UV, 2 to 10 minimal erythema doses, at 2-minimal erythema dose intervals. One day later, skin was evaluated for erythema and sunburn cells, and immunohistochemically for thymine dimers and p53. UV-induced cytokine formation, including interleukin (IL)-1alpha, IL-6, IL-8, and IL-10, and tumor necrosis factor-alpha, were evaluated by real-time polymerase chain reaction. RESULTS: CEFer provided significant and meaningful photoprotection for skin by all methods of evaluation. LIMITATIONS: The number of patients evaluated was relatively small. CONCLUSION: CEFer provided substantial UV photoprotection for skin. It is particularly effective for reducing thymine dimer mutations known to be associated with skin cancer. Its mechanism of action is different from sunscreens and would be expected to supplement the sun protection provided by sunscreens.

Full Text

Duke Authors

Cited Authors

  • Murray, JC; Burch, JA; Streilein, RD; Iannacchione, MA; Hall, RP; Pinnell, SR

Published Date

  • September 2008

Published In

Volume / Issue

  • 59 / 3

Start / End Page

  • 418 - 425

PubMed ID

  • 18603326

Pubmed Central ID

  • 18603326

Electronic International Standard Serial Number (EISSN)

  • 1097-6787

Digital Object Identifier (DOI)

  • 10.1016/j.jaad.2008.05.004

Language

  • eng

Conference Location

  • United States