Continuum embedding for photo-electrochemical surface processes
Publication
, Conference
Sinstein, M; Oberhofer, H; Berger, D; Blum, V; Reuter, K
Published in: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
March 13, 2016
Duke Scholars
Published In
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
ISSN
0065-7727
Publication Date
March 13, 2016
Volume
251
Publisher
AMER CHEMICAL SOC
Citation
APA
Chicago
ICMJE
MLA
NLM
Sinstein, M., Oberhofer, H., Berger, D., Blum, V., & Reuter, K. (2016). Continuum embedding for photo-electrochemical surface processes. In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY (Vol. 251). AMER CHEMICAL SOC.
Sinstein, Markus, Harald Oberhofer, Daniel Berger, Volker Blum, and Karsten Reuter. “Continuum embedding for photo-electrochemical surface processes.” In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, Vol. 251. AMER CHEMICAL SOC, 2016.
Sinstein M, Oberhofer H, Berger D, Blum V, Reuter K. Continuum embedding for photo-electrochemical surface processes. In: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. AMER CHEMICAL SOC; 2016.
Sinstein, Markus, et al. “Continuum embedding for photo-electrochemical surface processes.” ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, vol. 251, AMER CHEMICAL SOC, 2016.
Sinstein M, Oberhofer H, Berger D, Blum V, Reuter K. Continuum embedding for photo-electrochemical surface processes. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. AMER CHEMICAL SOC; 2016.
Published In
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
ISSN
0065-7727
Publication Date
March 13, 2016
Volume
251
Publisher
AMER CHEMICAL SOC