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Continuum embedding for photo-electrochemical surface processes

Publication ,  Conference
Sinstein, M; Oberhofer, H; Berger, D; Blum, V; Reuter, K
Published in: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
March 13, 2016

Duke Scholars

Published In

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY

ISSN

0065-7727

Publication Date

March 13, 2016

Volume

251

Publisher

AMER CHEMICAL SOC
 

Citation

APA
Chicago
ICMJE
MLA
NLM
Sinstein, M., Oberhofer, H., Berger, D., Blum, V., & Reuter, K. (2016). Continuum embedding for photo-electrochemical surface processes. In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY (Vol. 251). AMER CHEMICAL SOC.
Sinstein, Markus, Harald Oberhofer, Daniel Berger, Volker Blum, and Karsten Reuter. “Continuum embedding for photo-electrochemical surface processes.” In ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, Vol. 251. AMER CHEMICAL SOC, 2016.
Sinstein M, Oberhofer H, Berger D, Blum V, Reuter K. Continuum embedding for photo-electrochemical surface processes. In: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. AMER CHEMICAL SOC; 2016.
Sinstein, Markus, et al. “Continuum embedding for photo-electrochemical surface processes.” ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, vol. 251, AMER CHEMICAL SOC, 2016.
Sinstein M, Oberhofer H, Berger D, Blum V, Reuter K. Continuum embedding for photo-electrochemical surface processes. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. AMER CHEMICAL SOC; 2016.

Published In

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY

ISSN

0065-7727

Publication Date

March 13, 2016

Volume

251

Publisher

AMER CHEMICAL SOC