DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT.
Publication
, Journal Article
Tan, TY; Morehead, F; Gosele, U
Published in: Electrochemical Society Extended Abstracts
December 1, 1983
Duke Scholars
Published In
Electrochemical Society Extended Abstracts
ISSN
0160-4619
Publication Date
December 1, 1983
Volume
83-1
Start / End Page
432 / 433
Citation
APA
Chicago
ICMJE
MLA
NLM
Tan, T. Y., Morehead, F., & Gosele, U. (1983). DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT. Electrochemical Society Extended Abstracts, 83–1, 432–433.
Tan, T. Y., F. Morehead, and U. Gosele. “DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT.” Electrochemical Society Extended Abstracts 83–1 (December 1, 1983): 432–33.
Tan TY, Morehead F, Gosele U. DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT. Electrochemical Society Extended Abstracts. 1983 Dec 1;83–1:432–3.
Tan, T. Y., et al. “DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT.” Electrochemical Society Extended Abstracts, vol. 83–1, Dec. 1983, pp. 432–33.
Tan TY, Morehead F, Gosele U. DETERMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO THE Si SELF-DIFFUSION COEFFICIENT. Electrochemical Society Extended Abstracts. 1983 Dec 1;83–1:432–433.
Published In
Electrochemical Society Extended Abstracts
ISSN
0160-4619
Publication Date
December 1, 1983
Volume
83-1
Start / End Page
432 / 433