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Schottky effect model of electrical activity of metallic precipitates in silicon

Publication ,  Journal Article
Plekhanov, PS; Tan, TY
Published in: Applied Physics Letters
June 19, 2000

A quantitative model of the electrical activity of metallic precipitates in Si is formulated with an emphasis on the Schottky junction effects of the precipitate-Si system. Carrier diffusion and carrier drift in the Si space charge region are accounted for. Carrier recombination is attributed to the thermionic emission mechanism of charge transport across the Schottky junction rather than the surface recombination. It is shown that the precipitates can have a very large minority carrier capture cross-section. Under weak carrier generation conditions, the supply of minority carriers is found to be the limiting factor of the recombination process. The plausibility of the model is demonstrated by a comparison of calculated and available experimental results. © 2000 American Institute of Physics.

Duke Scholars

Published In

Applied Physics Letters

DOI

ISSN

0003-6951

Publication Date

June 19, 2000

Volume

76

Issue

25

Start / End Page

3777 / 3779

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences
 

Citation

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Plekhanov, P. S., & Tan, T. Y. (2000). Schottky effect model of electrical activity of metallic precipitates in silicon. Applied Physics Letters, 76(25), 3777–3779. https://doi.org/10.1063/1.126778
Plekhanov, P. S., and T. Y. Tan. “Schottky effect model of electrical activity of metallic precipitates in silicon.” Applied Physics Letters 76, no. 25 (June 19, 2000): 3777–79. https://doi.org/10.1063/1.126778.
Plekhanov PS, Tan TY. Schottky effect model of electrical activity of metallic precipitates in silicon. Applied Physics Letters. 2000 Jun 19;76(25):3777–9.
Plekhanov, P. S., and T. Y. Tan. “Schottky effect model of electrical activity of metallic precipitates in silicon.” Applied Physics Letters, vol. 76, no. 25, June 2000, pp. 3777–79. Scopus, doi:10.1063/1.126778.
Plekhanov PS, Tan TY. Schottky effect model of electrical activity of metallic precipitates in silicon. Applied Physics Letters. 2000 Jun 19;76(25):3777–3779.

Published In

Applied Physics Letters

DOI

ISSN

0003-6951

Publication Date

June 19, 2000

Volume

76

Issue

25

Start / End Page

3777 / 3779

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences