Submicron mask alignment by coherent light sources
Publication
, Journal Article
Ho, PS; Tan, TY
Published in: IBM Tech. Discl. Bull. (USA)
1980
A method of fabricating integrated circuits is disclosed based on the use of interference or diffraction patterns produced by coherent light sources which can be used for accurate alignment of multi-level masks. The principle of this method consists of two steps: the production of the interference pattern and the recognition of the interference pattern
Duke Scholars
Published In
IBM Tech. Discl. Bull. (USA)
Publication Date
1980
Volume
23
Issue
1
Start / End Page
360 / 361
Citation
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Chicago
ICMJE
MLA
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Ho, P. S., & Tan, T. Y. (1980). Submicron mask alignment by coherent light sources. IBM Tech. Discl. Bull. (USA), 23(1), 360–361.
Ho, P. S., and T. Y. Tan. “Submicron mask alignment by coherent light sources.” IBM Tech. Discl. Bull. (USA) 23, no. 1 (1980): 360–61.
Ho PS, Tan TY. Submicron mask alignment by coherent light sources. IBM Tech Discl Bull (USA). 1980;23(1):360–1.
Ho, P. S., and T. Y. Tan. “Submicron mask alignment by coherent light sources.” IBM Tech. Discl. Bull. (USA), vol. 23, no. 1, 1980, pp. 360–61.
Ho PS, Tan TY. Submicron mask alignment by coherent light sources. IBM Tech Discl Bull (USA). 1980;23(1):360–361.
Published In
IBM Tech. Discl. Bull. (USA)
Publication Date
1980
Volume
23
Issue
1
Start / End Page
360 / 361