Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si
Publication
, Journal Article
Tan, TY; Gardner, EE; Tice, WK
Published in: Applied Physics Letters
December 1, 1977
Conditions for effective intrinsic gettering by oxide precipitate induced dislocations, which we suggest as an important mechanism in explaining device leakage limited yield enhancement due to oxygen in Czochralski-grown Si wafers, are examined. The effectiveness of this mechanism is demonstrated.
Duke Scholars
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Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
December 1, 1977
Volume
30
Issue
4
Start / End Page
175 / 176
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences
Citation
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Tan, T. Y., Gardner, E. E., & Tice, W. K. (1977). Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si. Applied Physics Letters, 30(4), 175–176. https://doi.org/10.1063/1.89340
Tan, T. Y., E. E. Gardner, and W. K. Tice. “Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si.” Applied Physics Letters 30, no. 4 (December 1, 1977): 175–76. https://doi.org/10.1063/1.89340.
Tan TY, Gardner EE, Tice WK. Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si. Applied Physics Letters. 1977 Dec 1;30(4):175–6.
Tan, T. Y., et al. “Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si.” Applied Physics Letters, vol. 30, no. 4, Dec. 1977, pp. 175–76. Scopus, doi:10.1063/1.89340.
Tan TY, Gardner EE, Tice WK. Intrinsic gettering by oxide precipitate induced dislocations in Czochralski Si. Applied Physics Letters. 1977 Dec 1;30(4):175–176.
Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
December 1, 1977
Volume
30
Issue
4
Start / End Page
175 / 176
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences