Grain enhancement of thin silicon layers using optical processing
Publication
, Journal Article
Sopori, BL; Alleman, J; Chen, W; Tan, TY; Ravindra, NM
Published in: Materials Research Society Symposium Proceedings
January 1, 1997
We describe a new technique for producing large-grain, poly-Si thin films on low-cost glass substrates for solar cell applications. A layer of fine-grain poly-Si is deposited on metal-coated substrate followed by a grain enhancement using optical/thermal annealing at low temperatures (approximately 500 °C). The results show that in thin-layer silicon, less than 3 microns, grains can be formed in a short time (few minutes) with grain sizes larger than the film thickness. The possible mechanisms involved in this process are also presented.
Duke Scholars
Published In
Materials Research Society Symposium Proceedings
DOI
ISSN
0272-9172
Publication Date
January 1, 1997
Volume
470
Start / End Page
419 / 424
Citation
APA
Chicago
ICMJE
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Sopori, B. L., Alleman, J., Chen, W., Tan, T. Y., & Ravindra, N. M. (1997). Grain enhancement of thin silicon layers using optical processing. Materials Research Society Symposium Proceedings, 470, 419–424. https://doi.org/10.1557/proc-470-419
Sopori, B. L., J. Alleman, W. Chen, T. Y. Tan, and N. M. Ravindra. “Grain enhancement of thin silicon layers using optical processing.” Materials Research Society Symposium Proceedings 470 (January 1, 1997): 419–24. https://doi.org/10.1557/proc-470-419.
Sopori BL, Alleman J, Chen W, Tan TY, Ravindra NM. Grain enhancement of thin silicon layers using optical processing. Materials Research Society Symposium Proceedings. 1997 Jan 1;470:419–24.
Sopori, B. L., et al. “Grain enhancement of thin silicon layers using optical processing.” Materials Research Society Symposium Proceedings, vol. 470, Jan. 1997, pp. 419–24. Scopus, doi:10.1557/proc-470-419.
Sopori BL, Alleman J, Chen W, Tan TY, Ravindra NM. Grain enhancement of thin silicon layers using optical processing. Materials Research Society Symposium Proceedings. 1997 Jan 1;470:419–424.
Published In
Materials Research Society Symposium Proceedings
DOI
ISSN
0272-9172
Publication Date
January 1, 1997
Volume
470
Start / End Page
419 / 424