Boron diffusion in ultrathin silicon dioxide layers
Publication
, Conference
Fair, RB
Published in: PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996
January 1, 1996
Duke Scholars
Published In
PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996
ISBN
1-56677-151-X
Publication Date
January 1, 1996
Volume
96
Issue
1
Start / End Page
200 / 213
Location
LOS ANGELES, CA
Publisher
ELECTROCHEMICAL SOCIETY INC
Conference Name
3rd International Symposium on the Physics and Chemistry of SiO(2) and the Si-SiO(2) Interface. at the Spring Meeting of the Electrochemical-Society
Citation
APA
Chicago
ICMJE
MLA
NLM
Fair, R. B. (1996). Boron diffusion in ultrathin silicon dioxide layers. In H. Z. Massoud, E. H. Poindexter, & C. R. Helms (Eds.), PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996 (Vol. 96, pp. 200–213). LOS ANGELES, CA: ELECTROCHEMICAL SOCIETY INC.
Fair, R. B. “Boron diffusion in ultrathin silicon dioxide layers.” In PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996, edited by H. Z. Massoud, E. H. Poindexter, and C. R. Helms, 96:200–213. ELECTROCHEMICAL SOCIETY INC, 1996.
Fair RB. Boron diffusion in ultrathin silicon dioxide layers. In: Massoud HZ, Poindexter EH, Helms CR, editors. PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996. ELECTROCHEMICAL SOCIETY INC; 1996. p. 200–13.
Fair, R. B. “Boron diffusion in ultrathin silicon dioxide layers.” PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996, edited by H. Z. Massoud et al., vol. 96, no. 1, ELECTROCHEMICAL SOCIETY INC, 1996, pp. 200–13.
Fair RB. Boron diffusion in ultrathin silicon dioxide layers. In: Massoud HZ, Poindexter EH, Helms CR, editors. PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996. ELECTROCHEMICAL SOCIETY INC; 1996. p. 200–213.
Published In
PHYSICS AND CHEMISTRY OF SIO(2) AND THE SI-SIO(2) INTERFACE-3, 1996
ISBN
1-56677-151-X
Publication Date
January 1, 1996
Volume
96
Issue
1
Start / End Page
200 / 213
Location
LOS ANGELES, CA
Publisher
ELECTROCHEMICAL SOCIETY INC
Conference Name
3rd International Symposium on the Physics and Chemistry of SiO(2) and the Si-SiO(2) Interface. at the Spring Meeting of the Electrochemical-Society