RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON
Publication
, Conference
DEATON, R; MASSOUD, HZ
Published in: RAPID THERMAL AND INTEGRATED PROCESSING
1991
Duke Scholars
Published In
RAPID THERMAL AND INTEGRATED PROCESSING
ISBN
1-55899-118-2
Publication Date
1991
Volume
224
Start / End Page
373 / 378
Citation
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DEATON, R., & MASSOUD, H. Z. (1991). RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON. In RAPID THERMAL AND INTEGRATED PROCESSING (Vol. 224, pp. 373–378).
DEATON, R., and H. Z. MASSOUD. “RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON.” In RAPID THERMAL AND INTEGRATED PROCESSING, 224:373–78, 1991.
DEATON R, MASSOUD HZ. RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON. In: RAPID THERMAL AND INTEGRATED PROCESSING. 1991. p. 373–8.
DEATON, R., and H. Z. MASSOUD. “RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON.” RAPID THERMAL AND INTEGRATED PROCESSING, vol. 224, 1991, pp. 373–78.
DEATON R, MASSOUD HZ. RESPONSE-SURFACE ANALYSIS OF THE RAPID THERMAL-OXIDATION OF SILICON. RAPID THERMAL AND INTEGRATED PROCESSING. 1991. p. 373–378.
Published In
RAPID THERMAL AND INTEGRATED PROCESSING
ISBN
1-55899-118-2
Publication Date
1991
Volume
224
Start / End Page
373 / 378