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Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films

Publication ,  Journal Article
Piascik, JR; Thompson, JY; Bower, CA; Stoner, BR
Published in: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
September 1, 2005

Yttria (3 mol %)-stabilized zirconia (YSZ) thin films were deposited using radio frequency (rf) magnetron sputtering. The YSZ thin films were deposited over a range of temperatures (22-300 °C), pressures (5-25 mTorr), and gas compositions (ArO ratio). Initial studies characterized a select set of properties in relation to deposition parameters including: refractive index, structure, and film stress. X-ray diffraction (XRD) showed that the films are comprised of mainly monoclinic and tetragonal crystal phases. The film refractive index determined by prism coupling, depends strongly on deposition conditions and ranged from 1.959 to 2.223. Wafer bow measurements indicate that the sputtered YSZ films can have initial stress ranging from 86 MPa tensile to 192 MPa compressive, depending on the deposition parameters. Exposure to ambient conditions (25 °C, 75% relative humidity) led to large increase (∼100 MPa) in the compressive stress of the films. Environmental aging suggests the change in compressive stress was related to water vapor absorption. These effects were then evaluated for films formed under different deposition parameters with varying density (calculated packing density) and crystal structure (XRD). © 2005 American Vacuum Society.

Duke Scholars

Published In

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

DOI

ISSN

0734-2101

Publication Date

September 1, 2005

Volume

23

Issue

5

Start / End Page

1419 / 1424

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 09 Engineering
  • 02 Physical Sciences
 

Citation

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Piascik, J. R., Thompson, J. Y., Bower, C. A., & Stoner, B. R. (2005). Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 23(5), 1419–1424. https://doi.org/10.1116/1.2011403
Piascik, J. R., J. Y. Thompson, C. A. Bower, and B. R. Stoner. “Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films.” Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 23, no. 5 (September 1, 2005): 1419–24. https://doi.org/10.1116/1.2011403.
Piascik JR, Thompson JY, Bower CA, Stoner BR. Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2005 Sep 1;23(5):1419–24.
Piascik, J. R., et al. “Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films.” Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 23, no. 5, Sept. 2005, pp. 1419–24. Scopus, doi:10.1116/1.2011403.
Piascik JR, Thompson JY, Bower CA, Stoner BR. Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2005 Sep 1;23(5):1419–1424.

Published In

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

DOI

ISSN

0734-2101

Publication Date

September 1, 2005

Volume

23

Issue

5

Start / End Page

1419 / 1424

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 09 Engineering
  • 02 Physical Sciences