Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists
Publication
, Journal Article
Grune, GL; Greer, RW; Chern, RT; Stannett, VT
Published in: Journal of Macromolecular Science, Part A
1994
Duke Scholars
Published In
Journal of Macromolecular Science, Part A
DOI
ISSN
1060-1325
Publication Date
1994
Volume
31
Issue
9
Start / End Page
1193 / 1206
Publisher
Informa UK Limited
Related Subject Headings
- Polymers
- 3403 Macromolecular and materials chemistry
- 0912 Materials Engineering
- 0303 Macromolecular and Materials Chemistry
Citation
APA
Chicago
ICMJE
MLA
NLM
Grune, G. L., Greer, R. W., Chern, R. T., & Stannett, V. T. (1994). Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists. Journal of Macromolecular Science, Part A, 31(9), 1193–1206. https://doi.org/10.1080/10601329408545715
Grune, G. L., R. W. Greer, R. T. Chern, and V. T. Stannett. “Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists.” Journal of Macromolecular Science, Part A 31, no. 9 (1994): 1193–1206. https://doi.org/10.1080/10601329408545715.
Grune GL, Greer RW, Chern RT, Stannett VT. Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists. Journal of Macromolecular Science, Part A. 1994;31(9):1193–206.
Grune, G. L., et al. “Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists.” Journal of Macromolecular Science, Part A, vol. 31, no. 9, Informa UK Limited, 1994, pp. 1193–206. Crossref, doi:10.1080/10601329408545715.
Grune GL, Greer RW, Chern RT, Stannett VT. Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydr0Xyethyl Methacrylate)Cyclotriphosphazene Monomer and Its Application for Negative Resists. Journal of Macromolecular Science, Part A. Informa UK Limited; 1994;31(9):1193–1206.
Published In
Journal of Macromolecular Science, Part A
DOI
ISSN
1060-1325
Publication Date
1994
Volume
31
Issue
9
Start / End Page
1193 / 1206
Publisher
Informa UK Limited
Related Subject Headings
- Polymers
- 3403 Macromolecular and materials chemistry
- 0912 Materials Engineering
- 0303 Macromolecular and Materials Chemistry