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Investigation of RF and DC plasma electron sources for material processing applications

Publication ,  Conference
Del Pozo, S; Ribton, C; Smith, DR
Published in: IVEC 2017 - 18th International Vacuum Electronics Conference
July 2, 2017

This work presents the design, development and experimental results obtained from an RF plasma cathode Electron Beam (EB) gun for material processing applications. EB currents of up to 38 mA at -60 kV were extracted and correlated to Optical Emission Spectroscopy (OES) measurements. OES measurements and Argon II ratios were used to compare hollow and flat electrode designs as well as to examine changes in other key plasma parameters (i.e. plasma pressure and excitation power). The spectroscopic measurements and Argon II ratios indicated a higher ionization rate for the hollow electrode geometries and plasma parameters that generated larger EB currents (i.e. higher excitation power and lower pressure). The RF plasma cathode gun was compared to a DC plasma cathode gun. The DC plasma cathode produced larger currents than the RF plasma chamber. This result agreed with the OES measurements, which showed a higher ionisation in the DC plasma.

Duke Scholars

Published In

IVEC 2017 - 18th International Vacuum Electronics Conference

DOI

Publication Date

July 2, 2017

Volume

2018-January

Start / End Page

1 / 2
 

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Del Pozo, S., Ribton, C., & Smith, D. R. (2017). Investigation of RF and DC plasma electron sources for material processing applications. In IVEC 2017 - 18th International Vacuum Electronics Conference (Vol. 2018-January, pp. 1–2). https://doi.org/10.1109/IVEC.2017.8289676
Del Pozo, S., C. Ribton, and D. R. Smith. “Investigation of RF and DC plasma electron sources for material processing applications.” In IVEC 2017 - 18th International Vacuum Electronics Conference, 2018-January:1–2, 2017. https://doi.org/10.1109/IVEC.2017.8289676.
Del Pozo S, Ribton C, Smith DR. Investigation of RF and DC plasma electron sources for material processing applications. In: IVEC 2017 - 18th International Vacuum Electronics Conference. 2017. p. 1–2.
Del Pozo, S., et al. “Investigation of RF and DC plasma electron sources for material processing applications.” IVEC 2017 - 18th International Vacuum Electronics Conference, vol. 2018-January, 2017, pp. 1–2. Scopus, doi:10.1109/IVEC.2017.8289676.
Del Pozo S, Ribton C, Smith DR. Investigation of RF and DC plasma electron sources for material processing applications. IVEC 2017 - 18th International Vacuum Electronics Conference. 2017. p. 1–2.

Published In

IVEC 2017 - 18th International Vacuum Electronics Conference

DOI

Publication Date

July 2, 2017

Volume

2018-January

Start / End Page

1 / 2