High thermal conductivity of a hydrogenated amorphous silicon film
We measured the thermal conductivity κ of an 80μm thick hydrogenated amorphous silicon film prepared by hot-wire chemical-vapor deposition with the 3ω (80-300 K) and the time-domain thermoreflectance (300 K) methods. The κ is higher than any of the previous temperature dependent measurements and shows a strong phonon mean free path dependence. We also applied a Kubo based theory using a tight-binding method on three 1000 atom continuous random network models. The theory gives higher κ for more ordered models, but not high enough to explain our results, even after extrapolating to lower frequencies with a Boltzmann approach. Our results show that this material is more ordered than any amorphous silicon previously studied. © 2009 The American Physical Society.
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Citation
Published In
DOI
EISSN
ISSN
Publication Date
Volume
Issue
Related Subject Headings
- General Physics
- 51 Physical sciences
- 49 Mathematical sciences
- 40 Engineering
- 09 Engineering
- 02 Physical Sciences
- 01 Mathematical Sciences