Colloidal lithography patterning of silicon based solar absorber

This research investigates silicon-based absorbers to efficiently convert solar energy into heat in order to initiate chemical or physical reactions. We designed structures that utilize colloidal lithography to nano-pattern silicon-based solar absorbers as a way to enhance light trapping in the visible to near-infrared range. Colloidal lithography is a scalable and cost-effective patterning technique that uses self-assembled colloidal arrays, which removed to the costly masks in conventional lithography procedure. The silicon-based surface absorber achieved excellent absorption in the wavelength range from 380 nm to 1500 nm. The versatility and simplicity of the absorbers make them potentially applicable to a wide range of research projects and industrial products.

Duke Scholars

Author Xiawa Wang DKU Faculty