Relationship between resistance, localization length, and inelastic-scattering length.
Publication
, Journal Article
Band, YB; Baranger, HU; Avishai, Y
Published in: Physical review. B, Condensed matter
January 1992
Duke Scholars
Published In
Physical review. B, Condensed matter
DOI
ISSN
0163-1829
Publication Date
January 1992
Volume
45
Issue
3
Start / End Page
1488 / 1491
Citation
APA
Chicago
ICMJE
MLA
NLM
Band, Y. B., Baranger, H. U., & Avishai, Y. (1992). Relationship between resistance, localization length, and inelastic-scattering length. Physical Review. B, Condensed Matter, 45(3), 1488–1491. https://doi.org/10.1103/physrevb.45.1488
Band, Y. B., H. U. Baranger, and Y. Avishai. “Relationship between resistance, localization length, and inelastic-scattering length.” Physical Review. B, Condensed Matter 45, no. 3 (January 1992): 1488–91. https://doi.org/10.1103/physrevb.45.1488.
Band YB, Baranger HU, Avishai Y. Relationship between resistance, localization length, and inelastic-scattering length. Physical review B, Condensed matter. 1992 Jan;45(3):1488–91.
Band, Y. B., et al. “Relationship between resistance, localization length, and inelastic-scattering length.” Physical Review. B, Condensed Matter, vol. 45, no. 3, Jan. 1992, pp. 1488–91. Epmc, doi:10.1103/physrevb.45.1488.
Band YB, Baranger HU, Avishai Y. Relationship between resistance, localization length, and inelastic-scattering length. Physical review B, Condensed matter. 1992 Jan;45(3):1488–1491.
Published In
Physical review. B, Condensed matter
DOI
ISSN
0163-1829
Publication Date
January 1992
Volume
45
Issue
3
Start / End Page
1488 / 1491