An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials
Publication
, Journal Article
Feng, J; Forest, E; MacDowell, AA; Marcus, M; Padmore, H; Raoux, S; Robin, D; Scholl, A; Schlueter, R; Schmid, P; Stöhr, J; Wan, W; Wei, DH; Wu, Y
Published in: Journal of Physics: Condensed Matter
April 2005
A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed at the advanced light source (ALS). An electron mirror combined with a sophisticated magnetic beam separator is used to provide simultaneous correction of spherical and chromatic aberrations. Installed on an elliptically polarized undulator beamline, PEEM3 will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials.
Duke Scholars
Published In
Journal of Physics: Condensed Matter
Publication Date
April 2005
Volume
17
Start / End Page
S1339 / S1350
Related Subject Headings
- Fluids & Plasmas
- 5104 Condensed matter physics
- 4018 Nanotechnology
- 4016 Materials engineering
- 1007 Nanotechnology
- 0912 Materials Engineering
- 0204 Condensed Matter Physics
Citation
APA
Chicago
ICMJE
MLA
NLM
Feng, J., Forest, E., MacDowell, A. A., Marcus, M., Padmore, H., Raoux, S., … Wu, Y. (2005). An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials. Journal of Physics: Condensed Matter, 17, S1339–S1350.
Feng, J., E. Forest, A. A. MacDowell, M. Marcus, H. Padmore, S. Raoux, D. Robin, et al. “An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials.” Journal of Physics: Condensed Matter 17 (April 2005): S1339–50.
Feng J, Forest E, MacDowell AA, Marcus M, Padmore H, Raoux S, et al. An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials. Journal of Physics: Condensed Matter. 2005 Apr;17:S1339–50.
Feng, J., et al. “An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials.” Journal of Physics: Condensed Matter, vol. 17, Apr. 2005, pp. S1339–50.
Feng J, Forest E, MacDowell AA, Marcus M, Padmore H, Raoux S, Robin D, Scholl A, Schlueter R, Schmid P, Stöhr J, Wan W, Wei DH, Wu Y. An X-ray Photoemission Electron Microscope Using Electron Mirror Aberration Corrector for the Study of Complex Materials. Journal of Physics: Condensed Matter. 2005 Apr;17:S1339–S1350.
Published In
Journal of Physics: Condensed Matter
Publication Date
April 2005
Volume
17
Start / End Page
S1339 / S1350
Related Subject Headings
- Fluids & Plasmas
- 5104 Condensed matter physics
- 4018 Nanotechnology
- 4016 Materials engineering
- 1007 Nanotechnology
- 0912 Materials Engineering
- 0204 Condensed Matter Physics