Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography

A new 'top-down/bottom-up' approach for fabricating patterned polymer-brush arrays on the micrometer and nanometer length scales was reported. It was suggested that patterns with well-defined feature dimensions, shapes, and inter-feature spacings can be easily created over large areas by lift-off electron beam lithography (EBL). The utility of combining lift-off EBL for fabrication of Au patterns and surface-initiated polymerization to form micro- and nanostructures of stimulus-responsive polymer brushes on silicon surfaces was demonstrated. The fabrication approach was found to allow a high level of lateral control in patterning surfaces with complex polymer-brush structures over large surface area.

Duke Scholars

Author Stefan Zauscher Thomas Lord Department of Mechanical Engineering and Materia ...