Microfabrication of diamond films: selective deposition and etching
Publication
, Journal Article
Miyauchi, S; Kumagai, K; Miyata, K; Nishimura, K; Kobashi, K; Nakaue, A; Glass, JT; Buckley-Golder, IM
Published in: Surface and Coatings Technology
January 1, 1991
For the future application of diamond films to microelectronic devices and sensors, it is necessary to develop methods for making patterns a few micrometers wide of diamond films on substrates. To this end, two different methods of selected-area deposition were developed: reactive-ion etching and amorphous silicon masking of silicon substrates. It was shown that selective nucleation on silicon was achieved by these methods, and selective deposition of new diamonds on diamond film was carried out using the amorphous silicon masking method. The diamond films were etched using electron-beam assisted plasma etching, and consequently, a diamond film pattern of 10 μm wide was formed. © 1991.
Duke Scholars
Published In
Surface and Coatings Technology
DOI
ISSN
0257-8972
Publication Date
January 1, 1991
Volume
47
Issue
1-3
Start / End Page
465 / 473
Related Subject Headings
- Applied Physics
- 5104 Condensed matter physics
- 4016 Materials engineering
- 0912 Materials Engineering
- 0306 Physical Chemistry (incl. Structural)
- 0204 Condensed Matter Physics
Citation
APA
Chicago
ICMJE
MLA
NLM
Miyauchi, S., Kumagai, K., Miyata, K., Nishimura, K., Kobashi, K., Nakaue, A., … Buckley-Golder, I. M. (1991). Microfabrication of diamond films: selective deposition and etching. Surface and Coatings Technology, 47(1–3), 465–473. https://doi.org/10.1016/0257-8972(91)90312-K
Miyauchi, S., K. Kumagai, K. Miyata, K. Nishimura, K. Kobashi, A. Nakaue, J. T. Glass, and I. M. Buckley-Golder. “Microfabrication of diamond films: selective deposition and etching.” Surface and Coatings Technology 47, no. 1–3 (January 1, 1991): 465–73. https://doi.org/10.1016/0257-8972(91)90312-K.
Miyauchi S, Kumagai K, Miyata K, Nishimura K, Kobashi K, Nakaue A, et al. Microfabrication of diamond films: selective deposition and etching. Surface and Coatings Technology. 1991 Jan 1;47(1–3):465–73.
Miyauchi, S., et al. “Microfabrication of diamond films: selective deposition and etching.” Surface and Coatings Technology, vol. 47, no. 1–3, Jan. 1991, pp. 465–73. Scopus, doi:10.1016/0257-8972(91)90312-K.
Miyauchi S, Kumagai K, Miyata K, Nishimura K, Kobashi K, Nakaue A, Glass JT, Buckley-Golder IM. Microfabrication of diamond films: selective deposition and etching. Surface and Coatings Technology. 1991 Jan 1;47(1–3):465–473.
Published In
Surface and Coatings Technology
DOI
ISSN
0257-8972
Publication Date
January 1, 1991
Volume
47
Issue
1-3
Start / End Page
465 / 473
Related Subject Headings
- Applied Physics
- 5104 Condensed matter physics
- 4016 Materials engineering
- 0912 Materials Engineering
- 0306 Physical Chemistry (incl. Structural)
- 0204 Condensed Matter Physics