Diamond deposition using a planar radio frequency inductively coupled plasma
Publication
, Journal Article
Bozeman, SP; Tucker, DA; Stoner, BR; Glass, JT; Hooke, WM
Published in: Applied Physics Letters
January 1, 1995
A planar radio frequency inductively coupled plasma has been used to deposit diamond onto scratched silicon. This plasma source has been developed recently for use in large area semiconductor processing and holds promise as a method for scale up of diamond growth reactors. Deposition occurs in an annulus which coincides with the area of most intense optical emission from the plasma. Well-faceted diamond particles are produced when the substrate is immersed in the plasma.© 1995 American Institute of Physics.
Duke Scholars
Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
January 1, 1995
Volume
66
Issue
26
Start / End Page
3579
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
Citation
APA
Chicago
ICMJE
MLA
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Bozeman, S. P., Tucker, D. A., Stoner, B. R., Glass, J. T., & Hooke, W. M. (1995). Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters, 66(26), 3579. https://doi.org/10.1063/1.113793
Bozeman, S. P., D. A. Tucker, B. R. Stoner, J. T. Glass, and W. M. Hooke. “Diamond deposition using a planar radio frequency inductively coupled plasma.” Applied Physics Letters 66, no. 26 (January 1, 1995): 3579. https://doi.org/10.1063/1.113793.
Bozeman SP, Tucker DA, Stoner BR, Glass JT, Hooke WM. Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters. 1995 Jan 1;66(26):3579.
Bozeman, S. P., et al. “Diamond deposition using a planar radio frequency inductively coupled plasma.” Applied Physics Letters, vol. 66, no. 26, Jan. 1995, p. 3579. Scopus, doi:10.1063/1.113793.
Bozeman SP, Tucker DA, Stoner BR, Glass JT, Hooke WM. Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters. 1995 Jan 1;66(26):3579.
Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
January 1, 1995
Volume
66
Issue
26
Start / End Page
3579
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering