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Diamond deposition using a planar radio frequency inductively coupled plasma

Publication ,  Journal Article
Bozeman, SP; Tucker, DA; Stoner, BR; Glass, JT; Hooke, WM
Published in: Applied Physics Letters
December 1, 1995
Published version (DOI)

A planar radio frequency inductively coupled plasma has been used to deposit diamond onto scratched silicon. This plasma source has been developed recently for use in large area semiconductor processing and holds promise as a method for scale up of diamond growth reactors. Deposition occurs in an annulus which coincides with the area of most intense optical emission from the plasma. Well-faceted diamond particles are produced when the substrate is immersed in the plasma.© 1995 American Institute of Physics.

Duke Scholars

Brian R. Stoner
Author Brian R. Stoner Electrical and Computer Engineering
Jeffrey Glass
Author Jeffrey Glass Electrical and Computer Engineering

Published In

Applied Physics Letters

DOI

10.1063/1.113793

ISSN

0003-6951

Publication Date

December 1, 1995

Start / End Page

3579

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences
 

Citation

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Bozeman, S. P., Tucker, D. A., Stoner, B. R., Glass, J. T., & Hooke, W. M. (1995). Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters, 3579. https://doi.org/10.1063/1.113793
Bozeman, S. P., D. A. Tucker, B. R. Stoner, J. T. Glass, and W. M. Hooke. “Diamond deposition using a planar radio frequency inductively coupled plasma.” Applied Physics Letters, December 1, 1995, 3579. https://doi.org/10.1063/1.113793.
Bozeman SP, Tucker DA, Stoner BR, Glass JT, Hooke WM. Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters. 1995 Dec 1;3579.
Bozeman, S. P., et al. “Diamond deposition using a planar radio frequency inductively coupled plasma.” Applied Physics Letters, Dec. 1995, p. 3579. Scopus, doi:10.1063/1.113793.
Bozeman SP, Tucker DA, Stoner BR, Glass JT, Hooke WM. Diamond deposition using a planar radio frequency inductively coupled plasma. Applied Physics Letters. 1995 Dec 1;3579.

Published In

Applied Physics Letters

DOI

10.1063/1.113793

ISSN

0003-6951

Publication Date

December 1, 1995

Start / End Page

3579

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 10 Technology
  • 09 Engineering
  • 02 Physical Sciences