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Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source

Publication ,  Journal Article
Goeller, PT; Wang, Z; Sayers, DE; Glass, JT; Nemanich, RJ
Published in: Materials Research Society Symposium Proceedings
January 1, 1996

Thin films of (100) oriented CoSi2 have been electron beam evaporated onto Si(100) substrates from a mixed Co-Si target. A sharp c(2×2) low energy electron diffraction (LEED) pattern resulted after annealing the films to 800 °C. Extended x-ray absorption fine structure (EXAFS) of the film indicated the phase to be CoSi2. Quantitative x-ray photoelectron spectroscopy (XPS) analysis revealed the surface of the film to be slightly Si rich, indicating the Si terminated CoSi2 variant. Analysis of transmission electron microscope (TEM) diffraction patterns also provided evidence of the (100) orientation of the film.

Duke Scholars

Jeffrey Glass
Author Jeffrey Glass Electrical and Computer Engineering

Published In

Materials Research Society Symposium Proceedings

ISSN

0272-9172

Publication Date

January 1, 1996

Volume

402

Start / End Page

511 / 516
 

Citation

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Goeller, P. T., Wang, Z., Sayers, D. E., Glass, J. T., & Nemanich, R. J. (1996). Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium Proceedings, 402, 511–516.
Goeller, P. T., Z. Wang, D. E. Sayers, J. T. Glass, and R. J. Nemanich. “Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source.” Materials Research Society Symposium Proceedings 402 (January 1, 1996): 511–16.
Goeller PT, Wang Z, Sayers DE, Glass JT, Nemanich RJ. Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium Proceedings. 1996 Jan 1;402:511–6.
Goeller, P. T., et al. “Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source.” Materials Research Society Symposium Proceedings, vol. 402, Jan. 1996, pp. 511–16.
Goeller PT, Wang Z, Sayers DE, Glass JT, Nemanich RJ. Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium Proceedings. 1996 Jan 1;402:511–516.

Published In

Materials Research Society Symposium Proceedings

ISSN

0272-9172

Publication Date

January 1, 1996

Volume

402

Start / End Page

511 / 516