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Colloidal lithography for fabricating patterned polymer-brush microstructures.

Publication ,  Journal Article
Chen, T; Chang, DP; Jordan, R; Zauscher, S
Published in: Beilstein journal of nanotechnology
January 2012

We exploit a series of robust, but simple and convenient colloidal lithography (CL) approaches, using a microsphere array as a mask or as a guiding template, and combine this with surface-initiated atom-transfer radical polymerization (SI-ATRP) to fabricate patterned polymer-brush microstructures. The advantages of the CL technique over other lithographic approaches for the fabrication of patterned polymer brushes are (i) that it can be carried out with commercially available colloidal particles at a relatively low cost, (ii) that no complex equipment is required to create the patterned templates with micro- and nanoscale features, and (iii) that polymer brush features are controlled simply by changing the size or chemical functionality of the microspheres or the substrate.

Duke Scholars

Published In

Beilstein journal of nanotechnology

DOI

EISSN

2190-4286

ISSN

2190-4286

Publication Date

January 2012

Volume

3

Start / End Page

397 / 403

Related Subject Headings

  • 5104 Condensed matter physics
  • 4018 Nanotechnology
  • 1007 Nanotechnology
  • 0399 Other Chemical Sciences
  • 0301 Analytical Chemistry
 

Citation

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ICMJE
MLA
NLM
Chen, T., Chang, D. P., Jordan, R., & Zauscher, S. (2012). Colloidal lithography for fabricating patterned polymer-brush microstructures. Beilstein Journal of Nanotechnology, 3, 397–403. https://doi.org/10.3762/bjnano.3.46
Chen, Tao, Debby P. Chang, Rainer Jordan, and Stefan Zauscher. “Colloidal lithography for fabricating patterned polymer-brush microstructures.Beilstein Journal of Nanotechnology 3 (January 2012): 397–403. https://doi.org/10.3762/bjnano.3.46.
Chen T, Chang DP, Jordan R, Zauscher S. Colloidal lithography for fabricating patterned polymer-brush microstructures. Beilstein journal of nanotechnology. 2012 Jan;3:397–403.
Chen, Tao, et al. “Colloidal lithography for fabricating patterned polymer-brush microstructures.Beilstein Journal of Nanotechnology, vol. 3, Jan. 2012, pp. 397–403. Epmc, doi:10.3762/bjnano.3.46.
Chen T, Chang DP, Jordan R, Zauscher S. Colloidal lithography for fabricating patterned polymer-brush microstructures. Beilstein journal of nanotechnology. 2012 Jan;3:397–403.

Published In

Beilstein journal of nanotechnology

DOI

EISSN

2190-4286

ISSN

2190-4286

Publication Date

January 2012

Volume

3

Start / End Page

397 / 403

Related Subject Headings

  • 5104 Condensed matter physics
  • 4018 Nanotechnology
  • 1007 Nanotechnology
  • 0399 Other Chemical Sciences
  • 0301 Analytical Chemistry