Electron trapping in SiO2 at 295 and 77 °K
Journal Article (Journal Article)
The electron trapping behavior of SiO2 has been measured as a function of thickness at 295 and 77 °K. The devices used were metal-oxide-semiconductor devices with the SiO2 grown thermally. The results indicate bulk traps are dominant at 295 °K and traps associated with the Si-SiO2 interface are dominant at 77 °K. The effect of processing conditions was also studied and the optimum conditions are different for the two temperatures used for the measurements. These observations have been verified using a photo I-V technique. The generation of donor states in the SiO2 near the Si-SiO2 interface was observed as a result of the electron current through the SiO2.
Full Text
Duke Authors
Cited Authors
- Young, DR; Irene, EA; DiMaria, DJ; De Keersmaecker, RF; Massoud, HZ
Published Date
- December 1, 1979
Published In
Volume / Issue
- 50 / 10
Start / End Page
- 6366 - 6372
International Standard Serial Number (ISSN)
- 0021-8979
Digital Object Identifier (DOI)
- 10.1063/1.325727
Citation Source
- Scopus