Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.
Journal Article
We report a simple, reliable high-throughput method for patterning passivated silicon with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The approach completely protects silicon from chemical oxidation, provides precise control over the shape and size of the patterned features in the 100 nm domain, and gives rapid, ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules.
Full Text
Duke Authors
Cited Authors
- Shestopalov, AA; Morris, CJ; Vogen, BN; Hoertz, A; Clark, RL; Toone, EJ
Published Date
- May 2011
Published In
Volume / Issue
- 27 / 10
Start / End Page
- 6478 - 6485
PubMed ID
- 21520913
Pubmed Central ID
- 21520913
Electronic International Standard Serial Number (EISSN)
- 1520-5827
International Standard Serial Number (ISSN)
- 0743-7463
Digital Object Identifier (DOI)
- 10.1021/la200373g
Language
- eng