Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.

Journal Article

We report a simple, reliable high-throughput method for patterning passivated silicon with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The approach completely protects silicon from chemical oxidation, provides precise control over the shape and size of the patterned features in the 100 nm domain, and gives rapid, ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules.

Full Text

Duke Authors

Cited Authors

  • Shestopalov, AA; Morris, CJ; Vogen, BN; Hoertz, A; Clark, RL; Toone, EJ

Published Date

  • May 2011

Published In

Volume / Issue

  • 27 / 10

Start / End Page

  • 6478 - 6485

PubMed ID

  • 21520913

Pubmed Central ID

  • 21520913

Electronic International Standard Serial Number (EISSN)

  • 1520-5827

International Standard Serial Number (ISSN)

  • 0743-7463

Digital Object Identifier (DOI)

  • 10.1021/la200373g

Language

  • eng