Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.
Publication
, Journal Article
Shestopalov, AA; Morris, CJ; Vogen, BN; Hoertz, A; Clark, RL; Toone, EJ
Published in: Langmuir : the ACS journal of surfaces and colloids
May 2011
We report a simple, reliable high-throughput method for patterning passivated silicon with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The approach completely protects silicon from chemical oxidation, provides precise control over the shape and size of the patterned features in the 100 nm domain, and gives rapid, ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules.
Duke Scholars
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Published In
Langmuir : the ACS journal of surfaces and colloids
DOI
EISSN
1520-5827
ISSN
0743-7463
Publication Date
May 2011
Volume
27
Issue
10
Start / End Page
6478 / 6485
Related Subject Headings
- Surface Properties
- Succinimides
- Silicon
- Reproducibility of Results
- Printing
- Polyurethanes
- Oxidation-Reduction
- Nanotechnology
- Hydrolysis
- Chemical Physics
Citation
APA
Chicago
ICMJE
MLA
NLM
Shestopalov, A. A., Morris, C. J., Vogen, B. N., Hoertz, A., Clark, R. L., & Toone, E. J. (2011). Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon. Langmuir : The ACS Journal of Surfaces and Colloids, 27(10), 6478–6485. https://doi.org/10.1021/la200373g
Shestopalov, Alexander A., Carleen J. Morris, Briana N. Vogen, Amanda Hoertz, Robert L. Clark, and Eric J. Toone. “Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.” Langmuir : The ACS Journal of Surfaces and Colloids 27, no. 10 (May 2011): 6478–85. https://doi.org/10.1021/la200373g.
Shestopalov AA, Morris CJ, Vogen BN, Hoertz A, Clark RL, Toone EJ. Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon. Langmuir : the ACS journal of surfaces and colloids. 2011 May;27(10):6478–85.
Shestopalov, Alexander A., et al. “Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.” Langmuir : The ACS Journal of Surfaces and Colloids, vol. 27, no. 10, May 2011, pp. 6478–85. Epmc, doi:10.1021/la200373g.
Shestopalov AA, Morris CJ, Vogen BN, Hoertz A, Clark RL, Toone EJ. Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon. Langmuir : the ACS journal of surfaces and colloids. 2011 May;27(10):6478–6485.
Published In
Langmuir : the ACS journal of surfaces and colloids
DOI
EISSN
1520-5827
ISSN
0743-7463
Publication Date
May 2011
Volume
27
Issue
10
Start / End Page
6478 / 6485
Related Subject Headings
- Surface Properties
- Succinimides
- Silicon
- Reproducibility of Results
- Printing
- Polyurethanes
- Oxidation-Reduction
- Nanotechnology
- Hydrolysis
- Chemical Physics