UVB-emitting InAlGaN multiple quantum well synthesized using plasma-assisted molecular beam epitaxy
A high Al-content (y > 0.4) multi-quantum-well (MQW) structure with a quaternary InxAlyGa(1-x-y)N active layer was synthesized using plasma-assisted molecular beam epitaxy. The MQW structure exhibits strong carrier confinement and room temperature ultraviolet-B (UVB) photoluminescence an order of magnitude stronger than that of a reference InxAlyGa(1-x-y)N thin film with comparable composition and thickness. The samples were characterized using spectroscopic ellipsometry, atomic force microscopy, and high-resolution X-ray diffraction. Numerical simulations suggest that the UVB emission efficiency is limited by dislocation-related non-radiative recombination centers in the MQW and at the MQW - buffer interface. Emission efficiency can be significantly improved by reducing the dislocation density from 109cm-2 to 107cm-2 and by optimizing the width and depth of the quantum wells.
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- 51 Physical sciences
- 40 Engineering
- 0906 Electrical and Electronic Engineering
- 0206 Quantum Physics
- 0205 Optical Physics
Citation
Published In
DOI
EISSN
Publication Date
Volume
Issue
Related Subject Headings
- 51 Physical sciences
- 40 Engineering
- 0906 Electrical and Electronic Engineering
- 0206 Quantum Physics
- 0205 Optical Physics