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Modeling and optimization of the deposition of shape memory Polymers for information storage applications

Publication ,  Journal Article
Wornyo, E; May, GS; Gall, K
Published in: IEEE Transactions on Semiconductor Manufacturing
September 28, 2009

Shape memory polymers are of interest as high-capacity information storage media. This paper seeks to understand the effects of processing conditions on diethylene glycol dimethacrylate (DEGDMA) and bisphenol A ethoxylate dimethacrylate. Full factorial experiments are performed to characterize the impact of the following parameters: spin speed, spin time, and nitrogen flow rate. A total of ten experiments are conducted. The measured responses are film thickness, uniformity, hardness and modulus. Analysis of variance reveals the above input parameters are significant with respect to the output responses. The full factorial experiment is augmented by a central composite face centered (CCF) design to facilitate process modeling. Neural network models are developed to examine relationships. The average predictability of the models is better than 2% for training and less than 15% in testing. Genetic algorithms are used in optimizing recipes for the two materials. © 2006 IEEE.

Duke Scholars

Published In

IEEE Transactions on Semiconductor Manufacturing

DOI

ISSN

0894-6507

Publication Date

September 28, 2009

Volume

22

Issue

3

Start / End Page

409 / 416

Related Subject Headings

  • Industrial Engineering & Automation
  • 4009 Electronics, sensors and digital hardware
  • 0910 Manufacturing Engineering
  • 0906 Electrical and Electronic Engineering
 

Citation

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Wornyo, E., May, G. S., & Gall, K. (2009). Modeling and optimization of the deposition of shape memory Polymers for information storage applications. IEEE Transactions on Semiconductor Manufacturing, 22(3), 409–416. https://doi.org/10.1109/TSM.2009.2024902
Wornyo, E., G. S. May, and K. Gall. “Modeling and optimization of the deposition of shape memory Polymers for information storage applications.” IEEE Transactions on Semiconductor Manufacturing 22, no. 3 (September 28, 2009): 409–16. https://doi.org/10.1109/TSM.2009.2024902.
Wornyo E, May GS, Gall K. Modeling and optimization of the deposition of shape memory Polymers for information storage applications. IEEE Transactions on Semiconductor Manufacturing. 2009 Sep 28;22(3):409–16.
Wornyo, E., et al. “Modeling and optimization of the deposition of shape memory Polymers for information storage applications.” IEEE Transactions on Semiconductor Manufacturing, vol. 22, no. 3, Sept. 2009, pp. 409–16. Scopus, doi:10.1109/TSM.2009.2024902.
Wornyo E, May GS, Gall K. Modeling and optimization of the deposition of shape memory Polymers for information storage applications. IEEE Transactions on Semiconductor Manufacturing. 2009 Sep 28;22(3):409–416.

Published In

IEEE Transactions on Semiconductor Manufacturing

DOI

ISSN

0894-6507

Publication Date

September 28, 2009

Volume

22

Issue

3

Start / End Page

409 / 416

Related Subject Headings

  • Industrial Engineering & Automation
  • 4009 Electronics, sensors and digital hardware
  • 0910 Manufacturing Engineering
  • 0906 Electrical and Electronic Engineering