Handbook of Crystal Growth Thin Films and Epitaxy Second Edition
In Situ Characterization of Epitaxy
Publication
, Chapter
Brown, AS; Losurdo, M
January 1, 2015
Methods enabling in situ characterization of epitaxy have been crucial to achieving device-quality materials. This chapter focuses on key characterization techniques, including spectroscopic ellipsometry, reflectance anisotropy spectroscopy, desorption mass spectroscopy, and reflection high-energy electron diffraction applied to both molecular beam epitaxy and metal-organic chemical vapor deposition. Numerous examples are provided to illustrate how the techniques are used and can be applied to a range of materials synthesized as planar films, heterostructures, and nanostructures.
Duke Scholars
DOI
Publication Date
January 1, 2015
Volume
3
Start / End Page
1169 / 1209
Citation
APA
Chicago
ICMJE
MLA
NLM
Brown, A. S., & Losurdo, M. (2015). In Situ Characterization of Epitaxy. In Handbook of Crystal Growth Thin Films and Epitaxy Second Edition (Vol. 3, pp. 1169–1209). https://doi.org/10.1016/B978-0-444-63304-0.00029-9
Brown, A. S., and M. Losurdo. “In Situ Characterization of Epitaxy.” In Handbook of Crystal Growth Thin Films and Epitaxy Second Edition, 3:1169–1209, 2015. https://doi.org/10.1016/B978-0-444-63304-0.00029-9.
Brown AS, Losurdo M. In Situ Characterization of Epitaxy. In: Handbook of Crystal Growth Thin Films and Epitaxy Second Edition. 2015. p. 1169–209.
Brown, A. S., and M. Losurdo. “In Situ Characterization of Epitaxy.” Handbook of Crystal Growth Thin Films and Epitaxy Second Edition, vol. 3, 2015, pp. 1169–209. Scopus, doi:10.1016/B978-0-444-63304-0.00029-9.
Brown AS, Losurdo M. In Situ Characterization of Epitaxy. Handbook of Crystal Growth Thin Films and Epitaxy Second Edition. 2015. p. 1169–1209.
DOI
Publication Date
January 1, 2015
Volume
3
Start / End Page
1169 / 1209