Hybrid field-effect transistor based on a low-temperature melt-processed channel layer
Publication
, Journal Article
Mitzi, DB; Dimitrakopoulos, CD; Rosner, J; Medeiros, DR; Xu, Z; Noyan, C
Published in: Advanced Materials
December 3, 2002
Hybrid field-effect…. Low-melting point hybrid perovskits have enabled the first demonstration of melt-processed field-effect transistors (FET) channel layers with both large saturation- and linear-regime mobilities. The ability to tailor the melting properties of the semiconducting systems using the organic component of the hybrid, enables a reduction of the melting temperature to values low enough for processing on selected plastic substrates with even lower melting temperatures envisioned as wider range of organic cations is explored. With respect to vapor-phase deposition, melt processing represents a lower-energy process and relaxes requirements for molecular mobility and reorganization on the substrate during deposition.
Duke Scholars
Altmetric Attention Stats
Dimensions Citation Stats
Published In
Advanced Materials
DOI
ISSN
0935-9648
Publication Date
December 3, 2002
Volume
14
Issue
23
Start / End Page
1772 / 1776
Related Subject Headings
- Nanoscience & Nanotechnology
- 51 Physical sciences
- 40 Engineering
- 34 Chemical sciences
- 09 Engineering
- 03 Chemical Sciences
- 02 Physical Sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Mitzi, D. B., Dimitrakopoulos, C. D., Rosner, J., Medeiros, D. R., Xu, Z., & Noyan, C. (2002). Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials, 14(23), 1772–1776. https://doi.org/10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y
Mitzi, D. B., C. D. Dimitrakopoulos, J. Rosner, D. R. Medeiros, Z. Xu, and C. Noyan. “Hybrid field-effect transistor based on a low-temperature melt-processed channel layer.” Advanced Materials 14, no. 23 (December 3, 2002): 1772–76. https://doi.org/10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y.
Mitzi DB, Dimitrakopoulos CD, Rosner J, Medeiros DR, Xu Z, Noyan C. Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials. 2002 Dec 3;14(23):1772–6.
Mitzi, D. B., et al. “Hybrid field-effect transistor based on a low-temperature melt-processed channel layer.” Advanced Materials, vol. 14, no. 23, Dec. 2002, pp. 1772–76. Scopus, doi:10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y.
Mitzi DB, Dimitrakopoulos CD, Rosner J, Medeiros DR, Xu Z, Noyan C. Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials. 2002 Dec 3;14(23):1772–1776.
Published In
Advanced Materials
DOI
ISSN
0935-9648
Publication Date
December 3, 2002
Volume
14
Issue
23
Start / End Page
1772 / 1776
Related Subject Headings
- Nanoscience & Nanotechnology
- 51 Physical sciences
- 40 Engineering
- 34 Chemical sciences
- 09 Engineering
- 03 Chemical Sciences
- 02 Physical Sciences