Removal of NO by microwave discharge with the addition of CH4
Publication
, Journal Article
Tang, J; Zhang, T; Wang, A; Ren, L; Yang, H; Ma, L; Lin, L
Published in: Chemistry Letters
January 1, 2001
Removal of NO by a continuous microwave discharge at atmospheric pressure with the addition of CH
Duke Scholars
Published In
Chemistry Letters
DOI
ISSN
0366-7022
Publication Date
January 1, 2001
Issue
2
Start / End Page
140 / 141
Related Subject Headings
- General Chemistry
- 34 Chemical sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Tang, J., Zhang, T., Wang, A., Ren, L., Yang, H., Ma, L., & Lin, L. (2001). Removal of NO by microwave discharge with the addition of CH4. Chemistry Letters, (2), 140–141. https://doi.org/10.1246/cl.2001.140
Tang, J., T. Zhang, A. Wang, L. Ren, H. Yang, L. Ma, and L. Lin. “Removal of NO by microwave discharge with the addition of CH4.” Chemistry Letters, no. 2 (January 1, 2001): 140–41. https://doi.org/10.1246/cl.2001.140.
Tang J, Zhang T, Wang A, Ren L, Yang H, Ma L, et al. Removal of NO by microwave discharge with the addition of CH4. Chemistry Letters. 2001 Jan 1;(2):140–1.
Tang, J., et al. “Removal of NO by microwave discharge with the addition of CH4.” Chemistry Letters, no. 2, Jan. 2001, pp. 140–41. Scopus, doi:10.1246/cl.2001.140.
Tang J, Zhang T, Wang A, Ren L, Yang H, Ma L, Lin L. Removal of NO by microwave discharge with the addition of CH4. Chemistry Letters. 2001 Jan 1;(2):140–141.
Published In
Chemistry Letters
DOI
ISSN
0366-7022
Publication Date
January 1, 2001
Issue
2
Start / End Page
140 / 141
Related Subject Headings
- General Chemistry
- 34 Chemical sciences