Iterative aperture mask design in phase space using a rank constraint.
Publication
, Journal Article
Horstmeyer, R; Oh, SB; Raskar, R
Published in: Optics express
October 2010
We present an iterative camera aperture design procedure, which determines an optimal mask pattern based on a sparse set of desired intensity distributions at different focal depths. This iterative method uses the ambiguity function as a tool to shape the camera's response to defocus, and shares conceptual similarities with phase retrieval procedures. An analysis of algorithm convergence is presented, and experimental examples are shown to demonstrate the flexibility of the design process. This algorithm potentially ties together previous disjointed PSF design approaches under a common framework, and offers new insights for the creation of future application-specific imaging systems.
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Published In
Optics express
DOI
EISSN
1094-4087
ISSN
1094-4087
Publication Date
October 2010
Volume
18
Issue
21
Start / End Page
22545 / 22555
Related Subject Headings
- Software
- Optics and Photonics
- Optics
- Imaging, Three-Dimensional
- Image Processing, Computer-Assisted
- Equipment Design
- Engineering
- Computers
- Computer Simulation
- Algorithms
Citation
APA
Chicago
ICMJE
MLA
NLM
Horstmeyer, R., Oh, S. B., & Raskar, R. (2010). Iterative aperture mask design in phase space using a rank constraint. Optics Express, 18(21), 22545–22555. https://doi.org/10.1364/oe.18.022545
Horstmeyer, Roarke, Se Baek Oh, and Ramesh Raskar. “Iterative aperture mask design in phase space using a rank constraint.” Optics Express 18, no. 21 (October 2010): 22545–55. https://doi.org/10.1364/oe.18.022545.
Horstmeyer R, Oh SB, Raskar R. Iterative aperture mask design in phase space using a rank constraint. Optics express. 2010 Oct;18(21):22545–55.
Horstmeyer, Roarke, et al. “Iterative aperture mask design in phase space using a rank constraint.” Optics Express, vol. 18, no. 21, Oct. 2010, pp. 22545–55. Epmc, doi:10.1364/oe.18.022545.
Horstmeyer R, Oh SB, Raskar R. Iterative aperture mask design in phase space using a rank constraint. Optics express. 2010 Oct;18(21):22545–22555.
Published In
Optics express
DOI
EISSN
1094-4087
ISSN
1094-4087
Publication Date
October 2010
Volume
18
Issue
21
Start / End Page
22545 / 22555
Related Subject Headings
- Software
- Optics and Photonics
- Optics
- Imaging, Three-Dimensional
- Image Processing, Computer-Assisted
- Equipment Design
- Engineering
- Computers
- Computer Simulation
- Algorithms