Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths
Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of an FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.
Duke Scholars
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- Nuclear & Particles Physics
- 5106 Nuclear and plasma physics
- 0903 Biomedical Engineering
- 0299 Other Physical Sciences
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics
Citation
Published In
DOI
EISSN
ISSN
Publication Date
Volume
Issue
Start / End Page
Related Subject Headings
- Nuclear & Particles Physics
- 5106 Nuclear and plasma physics
- 0903 Biomedical Engineering
- 0299 Other Physical Sciences
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics