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Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths

Publication ,  Journal Article
Lv, P; Cao, GF; Wen, LJ; Kharusi, SA; Anton, G; Arnquist, IJ; Badhrees, I; Barbeau, PS; Beck, D; Belov, V; Bhatta, T; Breur, PA; Brodsky, JP ...
Published in: IEEE Transactions on Nuclear Science
December 1, 2020

Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of an FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.

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Published In

IEEE Transactions on Nuclear Science

DOI

EISSN

1558-1578

ISSN

0018-9499

Publication Date

December 1, 2020

Volume

67

Issue

12

Start / End Page

2501 / 2510

Related Subject Headings

  • Nuclear & Particles Physics
  • 5106 Nuclear and plasma physics
  • 0903 Biomedical Engineering
  • 0299 Other Physical Sciences
  • 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics
 

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Lv, P., Cao, G. F., Wen, L. J., Kharusi, S. A., Anton, G., Arnquist, I. J., … Ostrovskiy, I. (2020). Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths. IEEE Transactions on Nuclear Science, 67(12), 2501–2510. https://doi.org/10.1109/TNS.2020.3035172
Lv, P., G. F. Cao, L. J. Wen, S. A. Kharusi, G. Anton, I. J. Arnquist, I. Badhrees, et al. “Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths.” IEEE Transactions on Nuclear Science 67, no. 12 (December 1, 2020): 2501–10. https://doi.org/10.1109/TNS.2020.3035172.
Lv P, Cao GF, Wen LJ, Kharusi SA, Anton G, Arnquist IJ, et al. Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths. IEEE Transactions on Nuclear Science. 2020 Dec 1;67(12):2501–10.
Lv, P., et al. “Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths.” IEEE Transactions on Nuclear Science, vol. 67, no. 12, Dec. 2020, pp. 2501–10. Scopus, doi:10.1109/TNS.2020.3035172.
Lv P, Cao GF, Wen LJ, Kharusi SA, Anton G, Arnquist IJ, Badhrees I, Barbeau PS, Beck D, Belov V, Bhatta T, Breur PA, Brodsky JP, Brown E, Brunner T, Mamahit SB, Caden E, Cao L, Chambers C, Chana B, Charlebois SA, Chiu M, Cleveland B, Coon M, Craycraft A, Dalmasson J, Daniels T, Darroch L, St. Croix AD, Mesrobian-Kabakian AD, Deslandes K, Devoe R, Vacri MLD, DIlling J, DIng YY, Dolinski MJ, Doria L, Dragone A, Echevers J, Edaltafar F, Elbeltagi M, Fabris L, Fairbank D, Fairbank W, Farine J, Ferrara S, Feyzbakhsh S, Fucarino A, Gallina G, Gautam P, Giacomini G, Goeldi D, Gornea R, Gratta G, Hansen EV, Heffner M, Hoppe EW, Hobl J, House A, Hughes M, Iverson A, Jamil A, Jewell MJ, Jiang XS, Karelin A, Kaufman LJ, Koffas T, Krucken R, Kuchenkov A, Kumar KS, Lan Y, Larson A, Leach KG, Lenardo BG, Leonard DS, Li G, Li S, Li Z, Licciardi C, MacLellan R, Massacret N, McElroy T, Medina-Peregrina M, Michel T, Mong B, Moore DC, Murray K, Nakarmi P, Natzke CR, Newby RJ, Ning Z, Njoya O, Nolet F, Nusair O, Odgers K, Odian A, Oriunno M, Orrell JL, Ortega GS, Ostrovskiy I. Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths. IEEE Transactions on Nuclear Science. 2020 Dec 1;67(12):2501–2510.

Published In

IEEE Transactions on Nuclear Science

DOI

EISSN

1558-1578

ISSN

0018-9499

Publication Date

December 1, 2020

Volume

67

Issue

12

Start / End Page

2501 / 2510

Related Subject Headings

  • Nuclear & Particles Physics
  • 5106 Nuclear and plasma physics
  • 0903 Biomedical Engineering
  • 0299 Other Physical Sciences
  • 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics