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Effect of growth conditions on the electrical and optical properties of AlxIn1-xAs (0.48

Journal articles  - Journal Article
Brown, AS; Henige, JA; Schmitz, AE; Larson, LE
Published in: Applied Physics Letters
December 1, 1993

An increase of the Al- content of AlInAs layers above that of the composition which is lattice matched to InP (Al0.48In 0.52As) has been shown to lead to increased Schottky barrier height [Lin et al., Appl. Phys. Lett. 49, 1593 (1986)]. This technique has been used to realize improved gate-to-drain breakdown voltage in AlInAs-GaInAs modulation-doped transistors designed for power applications. This letter reports the observation of an optimum growth temperature regime for the Al-rich Schottky layers in the modulation-doped structure. Growth in this regime results in the highest conductivity for modulation-doped structures as well as the highest quality interface formation as determined from low temperature photoluminescence measurements.

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Published In

Applied Physics Letters

DOI

ISSN

0003-6951

Publication Date

December 1, 1993

Volume

62

Issue

1

Start / End Page

66 / 68

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
 

Published In

Applied Physics Letters

DOI

ISSN

0003-6951

Publication Date

December 1, 1993

Volume

62

Issue

1

Start / End Page

66 / 68

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering