Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks
We present for the first time a three-dimensional (3-D) Si CMOS interconnection system consisting of three layers of optically interconnected hybrid integrated Si CMOS transceivers. The transceivers were fabricated using 0.8-μm digital Si CMOS foundry circuits and were integrated with long wavelength InP-based emitters and detectors for through-Si vertical optical interconnections. The optical transmitter operated with a digital input and optical output with operation speeds up to 155 Mb/s. The optical receiver operated with an external optical input and a digital output up to 155 Mb/s. The transceivers were stacked to form 3-D through-Si vertical optical interconnections and a fabricated three-layer stack demonstrated optical interconnections between the three layers with operational speed of 1 Mb/s and bit-error rate of 10-9.
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- Optoelectronics & Photonics
- 5102 Atomic, molecular and optical physics
- 4009 Electronics, sensors and digital hardware
- 4008 Electrical engineering
- 0906 Electrical and Electronic Engineering
- 0206 Quantum Physics
- 0205 Optical Physics
Citation
Published In
DOI
ISSN
Publication Date
Volume
Issue
Start / End Page
Related Subject Headings
- Optoelectronics & Photonics
- 5102 Atomic, molecular and optical physics
- 4009 Electronics, sensors and digital hardware
- 4008 Electrical engineering
- 0906 Electrical and Electronic Engineering
- 0206 Quantum Physics
- 0205 Optical Physics