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Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks

Publication ,  Journal Article
Bond, SW; Vendier, O; Lee, M; Jung, S; Vrazel, M; Lopez-Lagunas, A; Chai, S; Dagnall, G; Brooke, M; Jokerst, NM; Wills, DS; Brown, A
Published in: IEEE Journal on Selected Topics in Quantum Electronics
March 1, 1999

We present for the first time a three-dimensional (3-D) Si CMOS interconnection system consisting of three layers of optically interconnected hybrid integrated Si CMOS transceivers. The transceivers were fabricated using 0.8-μm digital Si CMOS foundry circuits and were integrated with long wavelength InP-based emitters and detectors for through-Si vertical optical interconnections. The optical transmitter operated with a digital input and optical output with operation speeds up to 155 Mb/s. The optical receiver operated with an external optical input and a digital output up to 155 Mb/s. The transceivers were stacked to form 3-D through-Si vertical optical interconnections and a fabricated three-layer stack demonstrated optical interconnections between the three layers with operational speed of 1 Mb/s and bit-error rate of 10-9.

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Published In

IEEE Journal on Selected Topics in Quantum Electronics

DOI

ISSN

1077-260X

Publication Date

March 1, 1999

Volume

5

Issue

2

Start / End Page

276 / 286

Related Subject Headings

  • Optoelectronics & Photonics
  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware
  • 4008 Electrical engineering
  • 0906 Electrical and Electronic Engineering
  • 0206 Quantum Physics
  • 0205 Optical Physics
 

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Bond, S. W., Vendier, O., Lee, M., Jung, S., Vrazel, M., Lopez-Lagunas, A., … Brown, A. (1999). Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks. IEEE Journal on Selected Topics in Quantum Electronics, 5(2), 276–286. https://doi.org/10.1109/2944.778306
Bond, S. W., O. Vendier, M. Lee, S. Jung, M. Vrazel, A. Lopez-Lagunas, S. Chai, et al. “Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks.” IEEE Journal on Selected Topics in Quantum Electronics 5, no. 2 (March 1, 1999): 276–86. https://doi.org/10.1109/2944.778306.
Bond SW, Vendier O, Lee M, Jung S, Vrazel M, Lopez-Lagunas A, et al. Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks. IEEE Journal on Selected Topics in Quantum Electronics. 1999 Mar 1;5(2):276–86.
Bond, S. W., et al. “Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks.” IEEE Journal on Selected Topics in Quantum Electronics, vol. 5, no. 2, Mar. 1999, pp. 276–86. Scopus, doi:10.1109/2944.778306.
Bond SW, Vendier O, Lee M, Jung S, Vrazel M, Lopez-Lagunas A, Chai S, Dagnall G, Brooke M, Jokerst NM, Wills DS, Brown A. Three-layer 3-D silicon system using through-Si vertical optical interconnections and Si CMOS hybrid building blocks. IEEE Journal on Selected Topics in Quantum Electronics. 1999 Mar 1;5(2):276–286.

Published In

IEEE Journal on Selected Topics in Quantum Electronics

DOI

ISSN

1077-260X

Publication Date

March 1, 1999

Volume

5

Issue

2

Start / End Page

276 / 286

Related Subject Headings

  • Optoelectronics & Photonics
  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware
  • 4008 Electrical engineering
  • 0906 Electrical and Electronic Engineering
  • 0206 Quantum Physics
  • 0205 Optical Physics