PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES.
Publication
, Journal Article
Fair, RB; Rose, JE
Published in: Semiconductor International
December 1, 1987
The development of advanced computer-aided engineering and design (CAE/CAD) tools has greatly enhanced the ability of U. S. manufacturers to quickly design a product. Process development is an engineering-intensive effort, perpaps even more so than the IC design effort. Hundreds of variables must be tightly controlled, each of which can have a profound impact on final device performance. Results of a recent effort to address the deficiencies and lack of sophistication in available process models and simulation software are considered. This effort is embodied in the PREDICT program (Process Estimator for the Design of Integrated Circuit Technologies).
Duke Scholars
Published In
Semiconductor International
ISSN
0163-3767
Publication Date
December 1, 1987
Volume
10
Issue
13
Start / End Page
72 / 75
Related Subject Headings
- Applied Physics
Citation
APA
Chicago
ICMJE
MLA
NLM
Fair, R. B., & Rose, J. E. (1987). PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES. Semiconductor International, 10(13), 72–75.
Fair, R. B., and J. E. Rose. “PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES.” Semiconductor International 10, no. 13 (December 1, 1987): 72–75.
Fair RB, Rose JE. PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES. Semiconductor International. 1987 Dec 1;10(13):72–5.
Fair, R. B., and J. E. Rose. “PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES.” Semiconductor International, vol. 10, no. 13, Dec. 1987, pp. 72–75.
Fair RB, Rose JE. PROCESS SIMULATION OF SUBMICRON TECHNOLOGIES. Semiconductor International. 1987 Dec 1;10(13):72–75.
Published In
Semiconductor International
ISSN
0163-3767
Publication Date
December 1, 1987
Volume
10
Issue
13
Start / End Page
72 / 75
Related Subject Headings
- Applied Physics