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A versatile diffractive maskless lithography for single-shot and serial microfabrication.

Publication ,  Journal Article
Jenness, NJ; Hill, RT; Hucknall, A; Chilkoti, A; Clark, RL
Published in: Optics express
May 2010

We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of approximately 700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.

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Published In

Optics express

DOI

EISSN

1094-4087

ISSN

1094-4087

Publication Date

May 2010

Volume

18

Issue

11

Start / End Page

11754 / 11762

Related Subject Headings

  • Refractometry
  • Optics
  • Optical Devices
  • Miniaturization
  • Manufactured Materials
  • Light
  • Equipment Failure Analysis
  • Equipment Design
  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware
 

Citation

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ICMJE
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Jenness, N. J., Hill, R. T., Hucknall, A., Chilkoti, A., & Clark, R. L. (2010). A versatile diffractive maskless lithography for single-shot and serial microfabrication. Optics Express, 18(11), 11754–11762. https://doi.org/10.1364/oe.18.011754
Jenness, Nathan J., Ryan T. Hill, Angus Hucknall, Ashutosh Chilkoti, and Robert L. Clark. “A versatile diffractive maskless lithography for single-shot and serial microfabrication.Optics Express 18, no. 11 (May 2010): 11754–62. https://doi.org/10.1364/oe.18.011754.
Jenness NJ, Hill RT, Hucknall A, Chilkoti A, Clark RL. A versatile diffractive maskless lithography for single-shot and serial microfabrication. Optics express. 2010 May;18(11):11754–62.
Jenness, Nathan J., et al. “A versatile diffractive maskless lithography for single-shot and serial microfabrication.Optics Express, vol. 18, no. 11, May 2010, pp. 11754–62. Epmc, doi:10.1364/oe.18.011754.
Jenness NJ, Hill RT, Hucknall A, Chilkoti A, Clark RL. A versatile diffractive maskless lithography for single-shot and serial microfabrication. Optics express. 2010 May;18(11):11754–11762.
Journal cover image

Published In

Optics express

DOI

EISSN

1094-4087

ISSN

1094-4087

Publication Date

May 2010

Volume

18

Issue

11

Start / End Page

11754 / 11762

Related Subject Headings

  • Refractometry
  • Optics
  • Optical Devices
  • Miniaturization
  • Manufactured Materials
  • Light
  • Equipment Failure Analysis
  • Equipment Design
  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware