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THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.

Publication ,  Journal Article
Goesele, U; Tan, TY
Published in: Materials Research Society Symposia Proceedings
January 1, 1983

Duke Scholars

Published In

Materials Research Society Symposia Proceedings

ISSN

0272-9172

Publication Date

January 1, 1983

Volume

14

Start / End Page

153 / 157
 

Citation

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Goesele, U., & Tan, T. Y. (1983). THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings, 14, 153–157.
Goesele, U., and T. Y. Tan. “THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.Materials Research Society Symposia Proceedings 14 (January 1, 1983): 153–57.
Goesele U, Tan TY. THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings. 1983 Jan 1;14:153–7.
Goesele, U., and T. Y. Tan. “THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.Materials Research Society Symposia Proceedings, vol. 14, Jan. 1983, pp. 153–57.
Goesele U, Tan TY. THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings. 1983 Jan 1;14:153–157.

Published In

Materials Research Society Symposia Proceedings

ISSN

0272-9172

Publication Date

January 1, 1983

Volume

14

Start / End Page

153 / 157