THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.
Publication
, Journal Article
Goesele, U; Tan, TY
Published in: Materials Research Society Symposia Proceedings
January 1, 1983
Duke Scholars
Published In
Materials Research Society Symposia Proceedings
ISSN
0272-9172
Publication Date
January 1, 1983
Volume
14
Start / End Page
153 / 157
Citation
APA
Chicago
ICMJE
MLA
NLM
Goesele, U., & Tan, T. Y. (1983). THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings, 14, 153–157.
Goesele, U., and T. Y. Tan. “THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.” Materials Research Society Symposia Proceedings 14 (January 1, 1983): 153–57.
Goesele U, Tan TY. THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings. 1983 Jan 1;14:153–7.
Goesele, U., and T. Y. Tan. “THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON.” Materials Research Society Symposia Proceedings, vol. 14, Jan. 1983, pp. 153–57.
Goesele U, Tan TY. THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON. Materials Research Society Symposia Proceedings. 1983 Jan 1;14:153–157.
Published In
Materials Research Society Symposia Proceedings
ISSN
0272-9172
Publication Date
January 1, 1983
Volume
14
Start / End Page
153 / 157