Spin torque random access memory down to 22 nm technology
Publication
, Journal Article
Wang, X; Chen, Y; Li, H; Dimitrov, D; Liu, H
Published in: IEEE Transactions on Magnetics
January 1, 2008
Spin torque random access memory (ST-MRAM) design spaces down to CMOS 22 nm technology node are explored using a dynamic magnetic tunneling junction (MTJ)-CMOS model. The coupled dynamics of MTJ and CMOS is modeled by a combination of MTJ micromagnetic simulation and CMOS SPICE circuit simulation. The paper analyzes trade-offs between MTJ current threshold, MTJ thermal stability and CMOS driving strength. The analysis provides information on physics requirements and technology bottlenecks for MTJ to achieve maximum capacity supported by CMOS 22 nm technology node. Magnetic solutions for MTJ to fully achieve CMOS 22 nm potential capacities are reviewed. © 2008 IEEE.
Duke Scholars
Published In
IEEE Transactions on Magnetics
DOI
ISSN
0018-9464
Publication Date
January 1, 2008
Volume
44
Issue
11 PART 2
Start / End Page
2479 / 2482
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 09 Engineering
- 02 Physical Sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Wang, X., Chen, Y., Li, H., Dimitrov, D., & Liu, H. (2008). Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics, 44(11 PART 2), 2479–2482. https://doi.org/10.1109/TMAG.2008.2002386
Wang, X., Y. Chen, H. Li, D. Dimitrov, and H. Liu. “Spin torque random access memory down to 22 nm technology.” IEEE Transactions on Magnetics 44, no. 11 PART 2 (January 1, 2008): 2479–82. https://doi.org/10.1109/TMAG.2008.2002386.
Wang X, Chen Y, Li H, Dimitrov D, Liu H. Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics. 2008 Jan 1;44(11 PART 2):2479–82.
Wang, X., et al. “Spin torque random access memory down to 22 nm technology.” IEEE Transactions on Magnetics, vol. 44, no. 11 PART 2, Jan. 2008, pp. 2479–82. Scopus, doi:10.1109/TMAG.2008.2002386.
Wang X, Chen Y, Li H, Dimitrov D, Liu H. Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics. 2008 Jan 1;44(11 PART 2):2479–2482.
Published In
IEEE Transactions on Magnetics
DOI
ISSN
0018-9464
Publication Date
January 1, 2008
Volume
44
Issue
11 PART 2
Start / End Page
2479 / 2482
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 09 Engineering
- 02 Physical Sciences