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Spin torque random access memory down to 22 nm technology

Publication ,  Journal Article
Wang, X; Chen, Y; Li, H; Dimitrov, D; Liu, H
Published in: IEEE Transactions on Magnetics
January 1, 2008

Spin torque random access memory (ST-MRAM) design spaces down to CMOS 22 nm technology node are explored using a dynamic magnetic tunneling junction (MTJ)-CMOS model. The coupled dynamics of MTJ and CMOS is modeled by a combination of MTJ micromagnetic simulation and CMOS SPICE circuit simulation. The paper analyzes trade-offs between MTJ current threshold, MTJ thermal stability and CMOS driving strength. The analysis provides information on physics requirements and technology bottlenecks for MTJ to achieve maximum capacity supported by CMOS 22 nm technology node. Magnetic solutions for MTJ to fully achieve CMOS 22 nm potential capacities are reviewed. © 2008 IEEE.

Duke Scholars

Published In

IEEE Transactions on Magnetics

DOI

ISSN

0018-9464

Publication Date

January 1, 2008

Volume

44

Issue

11 PART 2

Start / End Page

2479 / 2482

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 09 Engineering
  • 02 Physical Sciences
 

Citation

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ICMJE
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Wang, X., Chen, Y., Li, H., Dimitrov, D., & Liu, H. (2008). Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics, 44(11 PART 2), 2479–2482. https://doi.org/10.1109/TMAG.2008.2002386
Wang, X., Y. Chen, H. Li, D. Dimitrov, and H. Liu. “Spin torque random access memory down to 22 nm technology.” IEEE Transactions on Magnetics 44, no. 11 PART 2 (January 1, 2008): 2479–82. https://doi.org/10.1109/TMAG.2008.2002386.
Wang X, Chen Y, Li H, Dimitrov D, Liu H. Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics. 2008 Jan 1;44(11 PART 2):2479–82.
Wang, X., et al. “Spin torque random access memory down to 22 nm technology.” IEEE Transactions on Magnetics, vol. 44, no. 11 PART 2, Jan. 2008, pp. 2479–82. Scopus, doi:10.1109/TMAG.2008.2002386.
Wang X, Chen Y, Li H, Dimitrov D, Liu H. Spin torque random access memory down to 22 nm technology. IEEE Transactions on Magnetics. 2008 Jan 1;44(11 PART 2):2479–2482.

Published In

IEEE Transactions on Magnetics

DOI

ISSN

0018-9464

Publication Date

January 1, 2008

Volume

44

Issue

11 PART 2

Start / End Page

2479 / 2482

Related Subject Headings

  • Applied Physics
  • 51 Physical sciences
  • 40 Engineering
  • 09 Engineering
  • 02 Physical Sciences